(August 2, 2010) — In this video interview with senior technical editor Debra Vogler from SEMICON West 2010, James Moyne, Applied Materials (AMAT), highlights a new technology: virtual metrology. Virtual metrology, on which Moyne presented at ASMC/SEMICON, enables tighter semi fab control using line data analysis. The summarized data is synched with real metrology data. Virtual metrology, a technique that has been around for a while, is now adaptive. Moyne explains.
Read more about semiconductor wafer inspection here: http://www.electroiq.com/index/Semiconductors/inspection.html
Also read: EDA interface value proposition from SEMATECH, 10/2008
Cycle-time improvements and time-waste reduction are being accomplished by improving equipment setup times and operations. Realizing even greater efficiency, however, requires the use of more sophisticated means of collecting data and controlling the equipment …
Visit the SEMICON West 2010 center on Solid State Technology: http://www.electroiq.com/index/Semiconductors/semiconwest2010.html