(August 18, 2010) — Brooks Instrument, provider of advanced flow measurement, control and level solutions, released product enhancements to the GF Series ultra-high purity mass flow controllers. Brooks has increased the range of flow rates available on the GF Series from the current 3 sccm to 30 slpm, to a new full-scale flow rate of 55 slpm. Along with a normally open valve option, this enables use in Epi, diffusion, batch chemical vapor deposition (CVD), and metal-organic chemical vapor deposition (MOCVD).
Additionally, Brooks enables precise measurement and control of ultra low pressure, toxic gases used in implant and CVD processes with the release of the GF120SD model.
The GF Series is a highly modular, user programmable, ultra-high purity mass flow controller designed for advanced semiconductor and thin-film processes. Through proactive monitoring of the world’s largest install base of MultiFlo, pressure-transient insensitive mass flow controllers and continuous improvement engineering practices, the GF Series combines exceptional flow repeatability, market-leading 300 ms flow control response time, the most comprehensive gas and flow range programmability, and long-term reliability.
“The GF Series install base is growing by the thousands, and we’re continuing to expand the platforms functionality to meet our customers’ needs and exceed expectations,” said Shaun Pewsey, Director of Field Marketing at Brooks Instrument. “The GF Series is a single platform, process-wide solution for the challenging and diverse needs of the modern semiconductor manufacturing facility.”
Brooks Instrument, LLC provides flow solutions, including glass and metal tube variable area meters (rotameters), thermal mass flow controllers and meters, Coriolis mass flow controllers, meters and transmitters, pressure control products, magnetic level instruments, and a variety of flow accessories. For more information, visit www.BrooksInstrument.com