(August 13, 2010) — In this video interview, Bryan Rice, SEMATECH, discusses the readiness of EUV. SEMATECH is partnering with Carl Zeiss for EUV process development. The next phase will be a blank inspection phase, beginning a few months after SEMICON West. Bryan speaks with senior technical editor Debra Vogler.

EUV was a major topic of conversation at SEMICON West 2010. Learn more in these video interviews on advanced lithography:

Research updates on EUV, mask, cleaning, etc from Leti: http://www.electroiq.com/index/display/semiconductors-article-display/1122585507/articles/solid-state-technology/semiconductors/lithography/2010/july/research-updates_on.html

EUV news from SEMICON West with Toppan Photomasks: http://www.electroiq.com/index/display/semiconductors-article-display/8262574301/articles/solid-state-technology/semiconductors/lithography/2010/july/euv-news_from_semicon.html

ASML: Exposure tool development for EUV: http://www.electroiq.com/index/display/semiconductors-article-display/0567969896/articles/solid-state-technology/semiconductors/lithography/2010/july/asml_-exposure_tool.html

Also read:

Lithography trends at Sokudo breakfast forum at http://www.electroiq.com/index/display/semiconductors-article-display/7993765989/articles/solid-state-technology/semiconductors/lithography/2010/july/semicon-west__lithography.html

and SEMICON West Lesson #2: Capital intensity & EUV at http://www.electroiq.com/index/display/semiconductors-article-display/0883314816/articles/solid-state-technology/semiconductors/industry-news/technology-news/2010/july/semicon-west_lesson.html

and visit the semiconductor lithography center from Solid State Technology at http://www.electroiq.com/index/Semiconductors/lithography.html