CD-SEM-metrology-tool-from-Advantest debuts for next-gen photomasks

(November 12, 2010 – BUSINESS WIRE) — Advantest Corporation (TSE: 6857, NYSE: ATE) released a SEM-based critical dimension (CD) measurement system for next-generation photomasks and patterned media. The E3630 is fully compatible with Advantest’s existing E3610/E3620 CD-SEM measurement systems and software, and boasts 30% improved linewidth repeatability.

The E3630 features a newly developed objective lens and ultra-low-vibration platform, enabling 30% higher linewidth repeatability compared to the E3610/E3620. This suits measuring the CD of the miniature-sized patterns on photomasks for EUV (extreme ultraviolet) and nanoimprint lithography. The tool is optimal for photomask development and manufacturing evaluation at the 22nm and 16nm production nodes.

As semiconductor device features continue to shrink, photomask patterning challenges have created new requirements for highly precise, stable metrology. Advantest’s E3600 series of CD-SEM measurement systems is in use by multiple semiconductor and photomask manufacturers.

Advantest produces automatic test equipment (ATE) for the semiconductor industry and measuring instruments used in the design and production of electronic instruments and systems. More information is available www.advantest.com.

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