(November 11, 2010 – Marketwire) — DCG Systems Inc. announced the P3X Cobra focused ion beam circuit edit system for complex edit challenges, even at advanced 22nm wafer process technologies. The P3X Cobra delivers ion beam performance from 2keV to 30keV beam energies. Its image resolution of 3nm with strong milling performance enables device editing on 32 and 22nm, and future IC fabrication processes.

The P3X Cobra integrates a FIB column into DCG’s P3X platform. DCG Systems products will be showcased November 16-17 at the 36th annual International Symposium for Testing and Failure Analysis (ISTFA 2010, Booth #614) to be held at the InterContinental Hotel Dallas, Addison, Texas. DCG is also introducing a direct FIB link to Tool Corporation’s LAVIS navigation software.

DCG Systems, Inc. provides semiconductor debug and characterization solutions for the semiconductor industry. For more information, visit http://www.dcgsystems.com.

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