(November 3, 2010 – Marketwire)Rigaku Innovative Technologies (RIT), X-ray optics provider, announced further expansion into the optics market for extreme ultraviolet  (EUV) lithography. RIT plans to continue supporting the industry by supplying Osmic Coatings, a line of multilayer coated optics that are essential to EUVL.

The company has been involved in EUVL since the mid-90s, when as Osmic Inc. it provided development optics for micro exposure tools (MET) and multilayer masks for industry-wide efforts that demonstrated the feasibility of EUVL. "Our next goal for company growth is to become the leading supplier of optical components in the emerging market for EUVL, the next generation of semiconductor manufacturing," said John McGill, RIT’s President and COO.

"Osmic supplied optics for EUVL community from the very beginning, and we are now ready to further expand our manufacturing to support the industry’s transition of EUVL into manufacturing phase," said Jim Rodriguez, VP of business development.

Ten of thousands of RIT’s multilayer optics are used in X-ray spectrometers and diffractometers. RIT’s synchrotron optics and neutron mirrors are utilized in synchrotrons and neutron diffraction facilities worldwide. Hundreds of RIT’s beam modules are installed and operating in state-of-the-art semiconductor fab metrology systems and pharmaceutical crystal protein research facilities. The company’s small-angle X-ray scattering (SAXS) cameras are installed at more than 30 sites, leading the development of major new analytical research areas in nanoscale structural and biological studies.

A subsidiary of Rigaku Corporation, RIT also develops pharmaceutical products to enable better understanding of protein and virus structures. In materials, RIT offers products used in automobiles, computers, construction, farming, and many other areas.

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