March 14, 2011 – — CAPRES A/S, a Danish developer of next-generation semiconductor metrology systems for the direct nano- and micro-scale electrical characterization of materials, announced a repeat order for its fully automated 300mm microRSP-A300 from an industry-leading semiconductor foundry in Asia.

Delivery and installation of the new metrology order will occur in May 2011 and follows the successful evaluation of the first one delivered in 2010.

With the development and production release of the microRSP-A300, CAPRES has addressed the challenges associated with in-line measurement on production wafers, reducing reliance on data extrapolation and monitor wafers to validate doping levels.

This production application of micro-scale sheet resistivity measurement allows, for the first time, immediate detection of process deviations thereby shortening the production control loop and enabling a commensurate reduction in work-in-process and losses due to out-of-specification production processes.

This customer finds that conventional Rs and optical metrology tools are not capable of measuring the sheet resistance of the very thin conductive films needed for production processes beyond the 40nm node, said Bo Hansen, CEO of CAPRES A/S, who suggests that many companies agree that optical metrology and Rs are not sufficient.

CAPRES A/S supplies micro-scale metrology systems for the semiconductor and magnetic storage industries. CAPRES metrology products use patented MEMS-based probe technology and are available in manual and fully automated configurations. More information is available at

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