Bring lithography <11nm with materials, not new steppers, says Brewer Science

May 17, 2011 — Lori Nye, Brewer Science, tells us how materials suppliers can take lithography below <10nm cost-effectively, speaking to senior technical editor Debra Vogler at The ConFab.

New innovative processes and materials could be the least costly way to get to <10nm lithography, says Nye, pointing out that EUV costs could prevent some smaller to mid-size fabs from converting. With the right use of materials, one can go 2 or 3 nodes beyond currently accepted lithography limits on exposure tools. While the materials costs are higher, the capital investment is lower than purchasing a new stepper.

Listen to the podcast:

  • Format: mp3
  • Length: 2:59
  • Size: 2.73 MB
  • Date: 05/17/11

Innovation can be counter-intuitive, Nye notes, and lithography process R&D is not always straightforward. Brewer Science is developing technologies for high-brightness LEDs (HB-LED) fab, which Nye says is not that different than traditional semiconductor R&D strategy. Nye is using The ConFab’s focus on high-growth markets to determine underlying needs in these new areas.

More from The ConFab:

Subscribe to Solid State Technology/Advanced Packaging.

Follow Solid State Technology on via editors Pete Singer, and Debra Vogler,

Or join our Facebook group


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.