ALD tool applies self-assembled monolayers for MEMS/NEMS, says Cambridge NanoTech

June 27, 2011 – Marketwire — Cambridge NanoTech added a Self-Assembled Monolayers (SAMs) capability in its line of Savannah atomic layer deposition (ALD) systems. SAMs coatings are inexpensive and versatile, says Cambridge NanoTech, noting their use in controlling wetting and adhesion, chemical resistance, bio compatibility, sensitization, and molecular recognition for sensors and nano fabrication. Nanoelectromechanical systems (NEMS), microelectromechanical systems (MEMS), and electronics makers are among SAM users.

The Savannah can deposit ALD and SAM films in the same chamber, notes Ganesh Sundaram, VP of technology at Cambridge Nanotech, adding that users can expand research or design development beyond current limitations.

The self-assembled monolayers deposition capability is available for 100, 200, and 300mm substrates or smaller pieces. Current Savannah can implement the SAMs feature in an upgrade.

A Savannah with SAMs capability will be on display in Cambridge NanoTech’s booth at the American Vacuum Society’s ALD 2011 conference this week at the Royal Sonesta in Cambridge, MA.

Cambridge NanoTech makes atomic layer deposition (ALD) systems capable of depositing ultra-thin films for research and industrial applications. To learn more, visit

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