July 14, 2011 — Kurt J. Lesker’s new Atomic Layer Deposition system, the ALD 150LX, can operate as a stand-alone or fully integrated cluster tool system for nano, microelectronics, optics, MEMS, semiconductor, photovoltaics, photonics, catalysis & fuel cells, and OLED manufacturing. It integrates process control, pumping, pressure management, and gas delivery packages tailored for the specific application.
The ALD 150LX features proprietary perpendicular flow reactant delivery with central pump for reactant dispersion. The expandable LVP, HVP precursor delivery suits multiple ALD layer deposition, including metals, oxides and nitride layers. Remote inductively coupled plasma source is optional.
The system heats substrates to 500°C, with heated chamber walls, delivery lines and pumping lines supporting deposition.
Up to 6" wafers can be handled, and the tool offers optional Load Lock. It is fully enclosed with a standalone control console. Monitoring is acheived in-situ via standard ellipsometry ports.
John Morris Scientific installs the system and provides onsite user training. Preventative maintenance and extended warranty agreements are also available.
For further information on the ALD-150LX, visit http://www.johnmorris.com.au/home.aspx or go to http://www.lesker.com/