EUV lithography infrastructure update from SEMATECH

July 13, 2011 — Stefan Wurm, SEMATECH, discusses his presentation on EUV lithography’s infrastructure (July 13, SEMICON West TechXPOT) in this video interview with Debra Vogler, senior technical editor.

He covers the last 2 years of development in EUV lithography mask tools, including how partnerships with industry evolve, and where the significant milestones fall.

The first EUV litho beta tools have been delivered, and now the motivation is increasing throughput and reducing defects. Resists are "almost there," he adds.

Gap Suppliers Building Solution? HVM Solution Funded? Time to HVM Solution
Mask Blank Actinic Inspection Yes (1 supplier) Funded by Japanese Consortium (EIDEC) 2013
Mask Defect Review  Yes (1 supplier) Funded by SEMATECH EMI Partnership 2014
Patterned Mask Inspection Yes (4 suppliers) Supplier/customer funded 2013-15

SEMATECH EMI initiative was successful in leading the industry to close the EUV mask infrastructure gaps:

  • Commercial actinic blank inspection solution meeting memory manufacturer needs through EIDEC


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