RF power generator suits various silicon fab steps

August 15, 2011 — MKS Instruments Inc. (NASDAQ:MKSI) introduced the elite RF Power Generator for RF deposition and etch in amorphous silicon photovoltaics (a-Si PV), light emitting diode (LED), and micro electro mechanical system (MEMS) manufacturing.

The 13.56MHz elite RF generator features an integrated, single-PCBA design and a compact, air-cooled form factor. It is designed to be cost-effective and easy to install. The generator is available in 2U full rack (pictured above) and 3U half rack (below) enclosures to allow for rack mounting and is available in power levels of 300W, 600W and 750W.

The full rack design eliminates cables and connectors; an inductive clamp technology protects the generator from adverse VSWR load conditions.

The generator is used in passivation, etch, physical (PVD) and chemical vapor deposition (CVD), atomic layer deposition (ALD), strip, cleaning, surface treatment, and coating, as well as back-end electronic packaging steps.

MKS Instruments Inc. is provides technologies to power, control, deliver, monitor, measure and analyze advanced processes in high-growth markets. Learn more at http://www.mksinst.com/.

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