ULVAC spectroscopic ellipsometer debuts for 300mm wafers

September 5, 2011 – JCN Newswire — ULVAC Inc. uncrated the UNECS-3000A spectroscopic ellipsometer, which can measure the thinness of a thin film and optical constant. The noncontact film measurement tool targets semiconductor and liquid crystal display (LCD) manufacturing control.

The tool can be used to evaluate resist film thickness for semiconductor lithography and organic EL display film, and in research and development as well as production-line measurement tasks.

Ulvac released the UNECS-2000 with a compact sensor and faster measurement in 2010. Teh UNECS-3000A builds on this technology with an automatic mapping function to measure the thickness distribution of the substrate surface and support 300mm wafers.

The UNECS-3000A measures 106 points on a 300mm wafer in 120 seconds (maximum speed of 20ms/point). Measurement speed is acheived via spectroscopic ellipsometry with two high-order retarders.

The automatic R-Theta stage supports a maximum 300mm wafer, automatically measuring surface thickness and optical constant distribution. Results are displayed in a color map. Up to six layers of film thickness can be analyzed at one time. (Film thickness and optical constants can be measured simultaneously only for the upper layer of film.)

Automatic height adjustment, analysis software, and other equipment are standard. The materials table file, containing optical constants for substrates and films, can be edited and added to by users.

Ulvac expects to sell 20 units during the first year.

ULVAC (Ultimate in Vacuum), Inc. (TSE: 6728) provides equipment for flat panel display, solar cell, semiconductor and electronics manufacturing. For more information, please visit www.ulvac.co.jp/eng.

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