Cymer wafer-level light source metrology targets advanced lithography control

October 6, 2011 — Light source supplier Cymer Inc. (Nasdaq:CYMI) launched SmartPulse, a next-generation data management tool following on the company’s OnPulse Plus product. SmartPulse monitors lithography light source parameters at the wafer, collecting data for a suite of reporting and analysis tools.

The beam metrology module in SmartPulse conveys real-time beam performance data from the light source. It supports Fault Detection Classification (FDC) requirements, enabling excursion detection and management in real time. The system’s beam parameter metrology supports multi patterning lithography illumination schemes for advanced nodes.

SmartPulse is available on argon fluoride (ArF) light sources.

Cymer Inc. (Nasdaq: CYMI) develops light sources used in semiconductor lithography. Please visit

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