MENT, JEOL optimize multi-resolution IC mask writing process

November 23, 2011 – Business Wire — Mentor Graphics Corporation (NASDAQ:MENT) and JEOL Ltd. will collaborate on integrated hardware and software for advanced IC lithography mask writing. The partnership aims to develop multi-resolution writing for shot count reduction of up to 30% compared to the conventional writing technique.

The companies will optimize interfaces between the Mentor mask data preparation and mask process correction (MPC) software and JEOL electron-beam (e-beam) lithography equipment.

The new multi-resolution writing work is enabling patterns


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