TEL, ASML develop EUV and other advanced lithography tech

November 30, 2011 – BUSINESS WIRE — Tokyo Electron Limited (TEL) and ASML Holding NV (ASML) will accelerate joint development activities in extreme ultraviolet (EUV) and argon fluoride (ArF) immersion lithography clusters.

This agreement on joint development acceleration was made in order to meet increasing customers


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