Nikon ArF lithography tool boasts 2x throughput

December 8, 2011 — Nikon Corporation released its NSR-S320F argon fluoride (ArF) lithography scanner for advanced 20nm node semiconductor device manufacturing. It boast high productivity and high accuracy, with stable operation in the field, Nikon reports.

Target applications include manufacturing of dense, small VLSI chips, where critical layers as well as non-critical layers are exposed by an ArF scanner, or KrF scanner.

The NSR-S320F scanner’s =3nm overlay accuracy achieved is comparable to ArF immersion scanners, thanks to the new Bird’s Eye Control interferometer system, and it has the potential for future expandability. Nikon’s Streamlign Platform for measurement can increase throughput by a factor of 2 over previous scanner generations, the company reports; 300mm wafer throughput is =200 wph. Encoders deliver stage position measurements without interference from air fluctuations, and in conjunction with the conventional interferometer measurements.

By increasing the number of FIA microscopes to five (Five-Eye FIA), alignment measurements can be performed in a shorter period of time. Five-Eye FIA minimizes throughput loss even when multiple points, nearly equal to the entire amount of shots, have to be measured.

Additional features:

  • Resolution: =65 nm
  • NA: 0.92
  • Light source: ArF excimer laser
  • Reduction magnification:


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