Heidelberg direct-write lithography system suits MEMS prototyping

January 25, 2012 — Heidelberg Instruments launched the µPG 501 table-top direct-write lithography system for prototyping micro electro mechanical system (MEMS), integrated optics, microfluidic/lab-on-a-chip, and other devices as well as mask production.

The µPG 501 can write structures down to 1μm 50mm²/min, offering an exposure time of less than one hour for a 2" x 2" pattern. μPG 501 is equipped with a high power LED light source; standard available wavelengths are 390 or 405nm (others on request). The light engine features the Digital Micromirror Device (DMD) as the imaging device. The μPG 501 can expose standard positive and negative photo resists as well as UV-resists such as SU8. Since the intensity dose is not limited, the system is suitable for applications which require thick resists. Utilizing sophisticated Gray Scale Exposure technology, the μPG 501 has the ability to create 3 dimensional structures such as blazed gratings or micro-lenses.

The system occupies a 60 x 75cm² footprint. It uses data conversion software to provide basic design operations, and features a viewer for the design data as well as for the converted pixel data. The software supports multiple data formats such as GDSII, DXF, GERBER, CIF, BMP, and STL.

The integrated metrology system enables the μPG 501 to do overlay exposures either by manual or automatic alignment to multiple targets on the substrate. Heidelberg Instruments’ Autofocus System compensates for flatness variation of the substrate in real-time. Custom made vacuum chucks can hold substrates up to 5" diameter. The stage is driven by linear motors and controlled by encoders at a resolution of 20nm.

Heidelberg Instruments produces high-precision maskless lithography systems for direct writing and photomask production. Learn more at http://www.himt.de/en/home/.

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