Applied Materials selects Praxair gas system for Varian VIIsta ion implant tools

February 15, 2012 – BUSINESS WIRE — The UpTime sub-atmospheric dopant gas delivery system from Praxair Electronics, a division of Praxair Inc. (NYSE: PX), will be Applied Materials’ (AMAT’s) factory default standard for the Varian VIISta ion implant platform.

Applied Materials’ Varian Semiconductor Equipment division chose Praxair’s UpTime system because of its "significantly improved operational productivity," on the VIIsta ion implant platform, said Matt Gaucher, GM of high current implantation at Varian Semiconductor Equipment, a division of Applied Materials Inc. Praxair will work with Applied Materials to bring additional productivity enhancements to the implant system, said Lisa Fanti, director of product commercialization at Praxair.

There are more than 1500 VIIsta systems installed globally.

In semiconductor manufacturing processes, ions are created from highly specialized gases and accelerated and implanted into silicon wafers to modify the properties of a thin film.

Praxair is also the preferred sub-atmospheric dopant supplier for the Solion implant tool for solar photovoltaics manufacturing, also developed by Varian Semiconductor Equipment.

Praxair Inc. is an industrial gases company, making atmospheric and process gases and high-performance surface coatings. More information on Praxair is available on the Internet at

Applied Materials acquired Varian Semiconductor Equipment in late 2011. Visit the Varian section of Applied Materials’ website at

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