Gore debuts high-purity 20nm PTFE filter for semiconductor, FPD fab

February 1, 2012 — W. L. Gore & Associates (Gore) introduced a 20 nm-rated polytetraflouroethylene (PTFE) filter, available in a high density polyethylene (HDPE) cartridge. The filter is optimized for the bulk processing of high-purity chemicals used in semiconductor and flat panel display (FPD) manufacturing.

Combined with the low metal ion and organic extractables of an all-HDPE cartridge, these filter cartridges enable a drop-in retention upgrade that maintains existing system flow, Gore reports: comparable to a best-in-class competitive 0.05µm-rated PTFE membrane filter (see figure below).

The filters use advanced Gore PTFE membrane structure to boost particle retention and process capacity. Available retention ratings include 0.1µm and 30nm, in addition to the 20nm product. The filter increases open porous area for fluid flow, using the unique structure for retention performance.

GORE PTFE filtration media is used in filters for semiconductor, electronics, ultrapure water and high-purity chemical applications. Visit www.gore.com/hdpefilters.

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