February 16, 2012 — ALD equipment maker Picosun Oy announced record particle levels — 1-2 added particles (>70nm) per wafer — with its PICOSUN P-300B atomic layer deposition (ALD) batch tool installed at Fraunhofer Institute for Photonic Microsystems (Fraunhofer IPMS). The tool also delivered reported records in process repeatability and film non-uniformity, down to 0.13 % 1σ for the best wafer.
"With its efficient wafer batch process Picosun meets our strict defect density requirements," states Dr. Tom Richter from Fraunhofer IPMS.
Fraunhofer IPMS focuses on developing technologies for micro electro mechanical system (MEMS) and micro optical mechanical systems (MOEMS) in its cleanrooms in Dresden, Germany. Services range from feasibility studies to the development of complete production technologies and pilot-fabrication, including characterization, qualification and foundry services for individual steps in the process or for technology modules.
Picosun Oy manufactures ALD systems. Learn more at www.picosun.com.
Also read: Picosun launches plasma enhanced atomic layer deposition source