HC Starck tailors thin-film sputtering for OLED displays

March 23, 2012 — H.C. Starck exhibited at the FPD China show this week, noting that the majority of flat panel display (FPD) production occurs in Japan, Korea, Taiwan and China. The rapid growth of organic light-emitting diode (OLED) screens in the FPD industry punctuates the increased need for high-tech materials, the company asserts.

”We are excited about the recent industry developments in FPD,” says Dmitry Shashkov, president and CEO of H.C. Starck’s Fabricated Products business segment. “New technologies such as ultra-high resolution displays and OLED demand different performance levels from all display materials and components."

H.C. Starck provides molybdenum planar and rotary sputtering targets for thin film sputtering applications in Asia. At FPD China, the company promoted its Gen 4.5 and larger molybdenum sputtering targets with high deposition efficiency, >99.5% density, and >99.95% purity. The planar targets are as large as 14 x 1580 x 1950; rotary targets reach 2700mm long.

H.C. Starck manufactures custom rotary and planar sputter targets from molybdenum (Mo), tantalum (Ta), niobium (Nb), tungsten (W), and their alloys. The company supplies refractory metals and technical ceramics to the electronics, chemicals, automotive, medical technology, aerospace, energy technology, and environmental technology industries, as well as mechanical engineering and tool manufacturers. Learn more at www.hcstarck.com.

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