EUV lithography optics on order at Zygo

April 6, 2012 – GLOBE NEWSWIRE — The Optical Systems Division of Zygo Corporation (Nasdaq:ZIGO) recorded a $2+ million order from a major semiconductor manufacturer to produce extreme ultraviolet (EUV) optics for advanced lithography.

This order is associated with the CSNE/SEMATECH consortium Micro Exposure Tool (MET-5) program that will help researchers achieve line widths of less than 16nm for semiconductors projected out to 2025. Zygo produces sub-nanometer surface quality optics, enabling the company to continue fabrication activities on this advanced SEMATECH program.

Development and production will take place over a 22-month period by Zygo’s Extreme Precision Optics (EPO) operation in Richmond, CA.

Zygo Corporation is a worldwide supplier of optical metrology instruments, precision optics, and electro-optical design and manufacturing services serving customers in the semiconductor capital equipment, bio-medical, scientific and industrial markets. Learn more at www.zygo.com.

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