April 9, 2012 — Barclays Capital compiled its 2011 analysis of semiconductor wafer fab equipment (WFE) spending, with a look at the top players and underlying trends by process step. Here, Barclays’ CJ Muse looks at the possibilities for ion implant.
Ion implant intensity (% of total WFE spending) rose by ~0.4% from ~3.4% in 2010 to ~3.8% in 2011, due to spending and capacity additions at chip makers. However, there is ultimately a ceiling to implant growth, and the sector will see flattish spending in 2012.
The high-energy segment grew 4% Y/Y as a mix within implant.
To learn about the major players in ion implant, such as Varian (VSEA) as part of Applied Materials (AMAT), read Wafer fab equipment leaders in 2011 and expectations for 2012
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