UNL taps SEMI-GAS for semiconductor metrology lab’s gas needs

May 8, 2012 — SEMI-GAS Systems, ultra-high-purity gas source and distribution system maker, and a division of Applied Energy Systems Inc, will outfit the University of Nebraska – Lincoln’s new Nanoscience Metrology Facility. Researchers will use the labs for metrology of semiconductor process development, including wafer etch, photolithography, and thin-film deposition.

The 32,000sq.ft. center will host nanofabrication, electron microscopy, scanning probe microscopy and other synthesis and characterization units. It is funded in part by a grant from the National Institute of Standards and Technology (NIST). SEMI-GAS’ high purity products and Applied Energy Systems’ field services will be used throughout the new labs and cleanrooms at the facility.

They will install numerous fully automatic Centurion gas cabinets, automatic switchover gas panels, wall-mount systems and manual manifolds, as well as an exhaust scrubber and hazardous gas detection system. Applied Energy Systems will support all of the SEMI-GAS equipment with an extensive installation and gas piping project, which includes installing high-purity single-wall and coaxial gas lines from the source systems to their designated points-of-use: a reactive ion etch and krypton fluoride laser, among other tools.

With the equipment installed, certified technicians from Applied Energy Systems’ will perform quality and safety checks, including analytical testing and line labeling. The final phase, in conjunction with University of Nebraska – Lincoln, will include system validation, equipment commissioning, and personnel training.

In late 2011, Applied Energy broke ground on its new SEMAT Center, a 2-story, 16000sq.ft. facility for SEMI-GAS Systems.

Semi-Gas Systems provides High Purity Gas Distribution Systems. Learn more at http://semi-gas.com/.

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