May 31, 2012 – PRNewswire — Picosun Oy, atomic layer deposition (ALD) tool manufacturer, delivered a second PICOSUN ALD tool to Uppsala University’s Ångström Laboratory in Sweden. The researchers will use the ALD system to develop processes for surface treatment of carbon nanostructures, transition metal and compound semiconductor thin film manufacturing, and ultrathin polymer layer deposition on various substrates.
The university first installed a Picosun ALD tool in 2009, in the Department of Materials Chemistry of the Ångström Laboratory. Nanexa, a Swedish nanotechnology company and a spin-off of Uppsala University, has been using PICOSUN ALD tools in production of biocompatible filters since 2010.
The ALD tools offer “versatility, flexibility and modular, multifunctional design” to implement novel, challenging ALD processes at “the strictest material quality requirements” for R&D and production volumes, said Professor Shili Zhang, chair professor and division head of the Solid-State Electronics Division of the Ångström Laboratory.
Picosun Oy makes atomic layer deposition (ALD) tools for research and production. Learn more at www.picosun.com.