PVD process generates 10″ AlN-on-sapphire template wafer at Kyma

June 1, 2012 — Kyma Technologies Inc., crystalline aluminum nitride (AlN) and gallium nitride (GaN) supplier, demonstrated a 10” (250mm) aluminum nitride (AlN) on sapphire template, manufactured on its proprietary plasma vapor deposition on nanocolumns (PVDNC) technology. The 10” sapphire substrate was provided courtesy of Monocrystal.

Photo 1. Kyma’s new 10” diameter PVDNC AlN on sapphire template with smaller diameter (6” and 4”) products.

AlN templates replace bare and patterned sapphire substrates for manufacturing blue, green, and white GaN light emitting diodes (LEDs).

Photo 2. Monocrystal’s 10” sapphire substrate vs 2” sapphire substrate. Source: Monocrystal.

LED manufacturers are transitioning from 2” to 6” wafers, Kyma Technologies reports. While 10” and 12” wafers remain primarily in demonstration phase today, LED makers will be moving to the larger wafer diameters in the next few years, the company predicts. Larger wafers produce more die per wafer, making tool utilization more efficient and achieving higher volume production.

Kyma has demonstrated 12” AlN-on-silicon (Si) templates that can be used for GaN growth. The company commissioned a high-volume PVDNC tool in early 2011 and has qualified customers on it for 2” processes, said Ed Preble, Kyma CTO.

Monocrystal supplies sapphire products for LEDs and metallization pastes for the solar manufacturing industry. For more information, visit www.monocrystal.com.

Kyma makes crystalline nitride semiconductor materials including gallium nitride (GaN), aluminum nitride (AlN), and aluminum gallium nitride (AlGaN) and related products and services. For more information about Kyma Technologies, visit www.kymatech.com.

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