Gigaphoton intros ArF excimer laser improvement tools

July 9, 2012 — Lithography light source manufacturer Gigaphoton Inc. will uncrate “s” series hardware and software products in Q3 2012, enhancing lithography exposure performance and reducing operating costs and downtime of the GT6xA ArF excimer laser series for multi-pattern immersion lithography scanners. Also read: Gigaphoton launches ArF excimer laser for multi-patterning immersion

The “s” series functions include:

  • sMPL creating greater depth of focus with precise spectrum control using a newly developed line-narrowing module (LNM) and dedicated software;
  • sGRYCOS lowering operating costs with a newly developed chamber (not compatible with the older GT60A model);
  • sTGM reaching higher uptime with a combination of a newly developed absolute wavelength calibration module (AWM) and control software;
  • sMONITORING ensuring high performance stability with sophisticated monitoring software.

The “s” series functions are included on the GT63A model as standard features (sMPL is an option) and as upgrades for the GT60A, GT61A, and GT62A.

“It is very important that the excimer laser used for lithography scanners enhance exposure performance and throughput as well as ensure reliability, said Hitoshi Tomaru, president of Gigaphoton, adding that costs must also remain low.

Gigaphoton makes high-performance DUV laser light sources used by major semiconductor chipmakers, and is developing LPP EUV technologies for high-volume production. Visit

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