Attend SPIE BACUS Symposium on photomasks in the deep sub-wavelength era

August 6, 2012 — The Annual SPIE/BACUS Symposium and co-located SPIE Photomask Technology exhibition, serving the worldwide photomask industry, will take place September 10-14, with the theme of successful integration and optimization of design, mask-making, and wafer fabrication in the deep sub-wavelength era.

This year’s keynote speaker is John Y Chen, VP of technology and foundry management of Nvidia, presenting “Transforming designs to chips: An end-user’s point-of-view on mask making.” Chen recently keynoted Solid State Technology’s The ConFab 2012, speaking about the concept of a virtual IDM.

The conference will cover lithography mask making (data prep and materials to patterning, etch and metrology); extreme ultraviolet (EUV) mask making, inspection, and repair and EUV infrastructure; nanoimprint mask making and applications; pixelated masks; and alternative masks.

Recent EUV news: TSMC takes 5% stake in ASML, joining Intel and EUV lithography project launches for better resolution at 14nm

Lithography applications topics will include double- and multi-patterning for advanced semiconductor nodes, how to enhance resolution and correct optical issues (OPC), source and mask optimization, and more.

The business side of photolithography will also be considered, such as managing masks in wafer fabs, controlling mask manufacturing, and other infrastructure elements.

Learn more about the conference and exhibition at

SPIE is an international society advancing an interdisciplinary approach to the science and application of light.

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