SEMI adds session, extends abstract deadline for China chip conference

October 16, 2012 – SEMI has extended the call for papers for the 2013 China Semiconductor Technology International Conference (CSTIC) to October 22. Paper abstract guidelines are listed here, and SEMI says there remain "just a few openings" for proposed talks on semiconductor technology and manufacturing. Original and overview papers from integrated device manufacturers (IDMs), equipment/materials suppliers, and academic and research institutes are welcomed.

The CSTIC (March 17-18 in Shanghai), held in conjunction with SEMICON China (March 19-21), is the largest annual semiconductor technology conference for the industry in China. (Last year’s CSTIC featured 100 technical lectures, 300 speakers, and nearly 1000 attendees.) Confirmed plenary speakers for CSTIC 2013 are RPI prof and Nobel Laureate Ivar Giaever, and "father of SOI technology" Ghavam Shahidi, IBM Fellow and director of Silicon Technology at IBM.

The CSTIC program offers 10 symposia covering all aspects of semiconductor technology and manufacturing, including a just-announced new track covering "circuit design, system integration and applications." Other tracks include: device engineering and technology; lithography and patterning; dry & wet etch and cleaning; thin-film technology; CMP, wafer substrate polishing and post-polish cleaning; materials and process integration for device and interconnection; packaging and assembly; metrology, reliability and testing; emerging semiconductor technologies; and advances in MEMS and sensor technologies.

SEMI and ECS are the organizers along with China’s High-Tech Expert Committee (CHTEC) with co-sponsors IEEE, MRS, and the China Electronics Materials Industry Association.


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