Deposition Sciences increases photolithography patterning capacity

200mm wafer processingDeposition Sciences, Inc. (DSI), manufacturer of highly durable thin film optical coatings, today introduced an enhanced capability to manufacture patterned optical filters. DSI has increased its capacity and resolution with the introduction of a new photolithography production line capable of patterning 200mm diameter wafers.

 “We are very excited to announce this enhanced capability,” said Michael Newell, director of sales and marketing.  “This new manufacturing line brings us better resolution, increased capacity, an ability to yield and coat more parts per wafer, and ultimately better pricing for our customers. And we are keeping pace with the semiconductor industry. Customers are looking to integrate their electronics with the optical filters. DSI can pattern populated wafers containing active devices, and semi-conductor fab houses are doing more and more at the 200mm wafer scale.”

The new patterning capability provides an enhanced view or enhanced detection in multi-spectral imaging tasks by fusing together information from different wavelength bands.  Other applications include satellite imaging, UAV overhead reconnaissance, machine vision, food and industrial inspection, automotive, biomedical sensing, color filter arrays for CCD and CMOS cameras, reticles, and more. 

For over 25 years, Deposition Sciences has produced optical thin film filter coatings.  DSI’s coating capability ranges from the ultraviolet (UV), through the visible and includes near-infrared (NIR), midwave-infrared (MWIR) and out to the longwave-infrared (LWIR). 


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