Gigaphoton Inc. announced today that it has completed delivery of its first ArF immersion Excimer laser supporting 450mm multi-patterning, the GT64A.

This product is the latest advancement in Gigaphoton’s ArF platform – offering even greater levels of performance and efficiency to support the growing requirements of our customers’ High Volume Manufacturing (HVM) environment. The product inherits proven "timeless" technologies from its predecessors such as the twin-chamber architecture, output control algorithm, and beam alignment technologies, and advances them further to achieve greater output power, beam performance and stability.

The GT64A, with its extremely high laser efficiency levels, can produce variable power outputs ranging from 90W to 120W for multi-patterning in 450mm wafer production applications. Power output can be automatically adjusted to optimal levels based on the scanner’s requirements and the customers’ process. With its highly stable energy, spectral bandwidth, and beam profile, combined with longer pulse durations, the product offers greatly improved overlay accuracy, critical dimension control, and minimization of line edge roughness – all of which are extremely important for multi-patterning.

"To support the semiconductor industry’s health and growth during turbulent times, it is essential to our company’s existence that we continue to focus on delivering the most effective Excimer laser technology for HVM in conjunction with world-class support and services", said Hitoshi Tomaru, president and CEO of Gigaphoton. "With this in mind, I am very pleased we were able to deliver our first product designed to support the highly anticipated 450mm wafer scanners. This achievement also signifies our contribution to the industry’s goal of maturing 450mm technology – bringing us one step closer to HVM."