HORIBA Semiconductor, global leader in process metrology and control components, introduces its new HD-960L for sub-parts-per-billion level monitoring of DO in chemicals with a low sample-consumption rate. The HD-960L is specifically designed to enable processes that require ultra-low or controlled levels of DO.
The HD-960L uses an innovative polarographic sensor and an auto-ranging feature to give users real-time trace DO data from ppb level to saturation in critical process chemistries. The technology allows users to monitor DO levels, avoid process excursions due to oxidation and more effectively control silicon etch rates.
“The HD-960L’s low detection limit, high accuracy, low sample consumption and wide range make it the perfect choice for critical next-generation processes that require low levels of DO,” said Mark Mahoney, Business Development Manager for Wet Products at HORIBA Semiconductor.
HORIBA technologies for wet process monitoring are used globally for critical process monitoring and control and the new HD-960L represents the latest in applications-driven technology development that supports the semiconductor industry.
HORIBA Semiconductor, part of HORIBA INSTRUMENTS, INC., headquartered in the United States, provides an array of instruments and solutions for applications across a broad range of semiconductor processes.