Pall intros 5nm PTFE filtration membrane

Pall Corporation announced this week the availability of its new 5nm XpressKleen filter. The filter is the latest addition to the company’s XpressKleen chemical filter line-up and is a key component of Pall’s disposable PFA (Perfluoroalkoxy alkanes) KleenChange assemblies. The new 5 nm XpressKleen filter is designed to meet the growing defectivity challenges of sub-10nm critical chemical processing. It demonstrates finer retention, fast flow, and higher purity than previous filters. Retention is validated using Pall’s gold nanoparticle challenge test.

“The 5 nm XpressKleen filter leverages Pall’s proprietary ‘XP’ cleaning process that reduces trace metal contamination by 50% to less than 500 parts per trillion (ppt) total for nineteen critical metal ions for a ten-inch device,” said Steve Chisolm, President of Pall Microelectronics. “The ‘XP’ cleaning process also removes organics, surface particles, and anions. Pall is proud to bring these important purity and retention capabilities to the market to enable the semiconductor scaling cadence.”

Pall’s completely integrated manufacturing capability extends from PTFE resin to the finished filter device. The company’s advanced manufacturing process uses clean room manufacturing and statistical process control to ensure the reliability and performance of every 5nm XpressKleen filter.

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