SUSS MicroTec announces new Mask Aligner series MA/BA Gen4

SUSS MicroTec, a supplier of equipment and process solutions for the semiconductor industry and related markets, announced the launch of the MA/BA Gen4 series today. The new generation of SUSS MicroTec’s semi-automated Mask and Bond Aligners extends its capabilities by major improvements in alignment accuracy, ergonomic design and further reduced cost of ownership. With the launch of the fourth generation, SUSS MicroTec introduces a new platform system. The two platform types are configured differently and consist of the MA/BA Gen4 for standard processes and the MA/BA Gen4 Pro series for advanced high-end processes. By moving to this new platform concept, SUSS MicroTec further optimizes the Mask Aligner product portfolio to better align with customer requirements.

Main application of SUSS MicroTec’s MA/BA Gen4 series is full-field lithography in Academia, MEMS, 3D Integration and the Compound Semiconductor market. It furthermore handles processes like bond alignment, fusion bonding and SMILE imprint. In addition to standard wafer processing the MA/BA Gen4 series reliably processes delicate substrates, such as fragile, warped or uneven surfaced wafers.

“Our new manual Mask Aligner series sets a high benchmark regarding cost efficiency, user friendliness and leading edge process results” said Dr. Per-Ove Hansson, CEO SUSS MicroTec. “With this new platform concept, we further align with different customer requirements – the MA/BA Gen4 for standard lithography processes or the leading edge MA/BA Gen4 Pro for small-series production and more demanding solutions, e.g. our Soft Conformal Imprint Lithography (SCIL) solution.”


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