Entegris EUV 1010 Reticle Pod receives ASML qualification

Entegris, Inc. (NASDAQ: ENTG) today released the next generation EUV 1010 Reticle Pod for high-volume IC manufacturing using extreme ultraviolet (EUV) lithography. Developed in close collaboration with ASML, one of the world’s largest manufacturers of chip-making equipment, Entegris’s EUV 1010 is the first to be qualified by ASML for use in the NXE:3400B and beyond.

As the semiconductor industry begins ramping EUV lithography for the high-volume manufacturing (HVM) of advanced technology nodes, keeping EUV reticles defect-free is more demanding than ever.  Entegris’s EUV 1010 Reticle Pod is now fully qualified by ASML for their latest generation scanner having demonstrated outstanding protection of the EUV reticles, including against the most critical particle challenges.  As a result, Entegris’s EUV 1010 enables customers to safely transition to smaller and smaller line widths, as needed for the most advanced lithography processes.

To achieve these levels of performance within the NXE:3400B scanner, Entegris developed new technologies for contacting the reticles and controlling the environment. “The Entegris EUV 1010 represents a significant breakthrough in improving defectivity so customers implementing HVM for advance technology nodes can focus on increasing efficiency and throughput,” said Paul Magoon, vice president of wafer and reticle handing for Entegris. “Development and testing with ASML ensures that EUV 1010 has been qualified for the most advanced EUV scanner available.”

Entegris is ISO 9001 certified and has manufacturing, customer service and/or research facilities in the United States, China, France, Germany, Israel, Japan, Malaysia, Singapore, South Korea and Taiwan.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

One thought on “Entegris EUV 1010 Reticle Pod receives ASML qualification”

  1. Christopher Norton

    Using the WIS, Inc. PDS 1020-G2 defect scanner for this application will provide critical Pre-Post handling status of all of your Reticles.
    Stand alone desktop models are a 30″ Cube.
    This 30″ cube has been integrated within most major stocker / handler products.
    Using client acceptance criteria the inspection system may be set up for a simple and fast Go No Go inspection.
    Or, data may be further analyzed using our Image Analysis Software option to differentiate between particles, scratches, tears, dimples and other defects.

Comments are closed.