3D Integration

3D INTEGRATION ARTICLES



Inside the Hybrid Memory Cube

09/18/2013  The HMC provides a breakthrough solution that delivers unmatched performance with the utmost reliability.

Packaging at The ConFab

09/18/2013  At The ConFab conference in Las Vegas in June, Mike Ma, VP of Corporate R&D at Siliconware (SPIL), announced a new business model for interposer based SiP’s, namely the “turnkey OSAT model.” In his presentation “The expanding Role of OSATS in the Era of System Integration,” Ma looked at the obstacles to 2.5/3D implementation and came up with the conclusion that cost is still a significant deterrent to all segments.

Collaboration needed on 3D-IC

09/05/2013  The history of semiconductors has been a history of collaboration. Today, a similar industry-wide collaborative approach to 3D stacked ICs is needed to reach widespread 3D-IC adoption and continue the amazing progress our industry has historically achieved.

Stanford and UT Austin professors to be honored at annual SRC TECHCON

09/05/2013  Semiconductor Research Corporation (SRC), a university-research consortium for semiconductors and related technologies, will honor professors from Stanford University and University of Texas at Austin with awards for chip-related research and education at SRC’s annual TECHCON conference Sept. 9-10.

EV Group unveils new via-filling process to improve reliability of 3D-IC/TSV packaging

09/04/2013  EV Group, a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today unveiled a new polymer via-filling process for 3D-IC/through-silicon-via semiconductor packaging applications.

Dow Corning and EV Group to collaborate on temporary bonding materials for 3D-IC

09/03/2013  EV Group (EVG), a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, announced today that Dow Corning has joined its network of top technology providers to support EVG's LowTemp platform for room-temperature wafer bonding and debonding processes.

Moore's Law Dead By 2022: Crying Wolf?

08/30/2013  Zvi Or-Bach, President & CEO of MonolithIC 3D Inc. blogs about recent predictions regarding the demise of continued scaling.

Entegris and imec collaborate on 3D wafer handling and shipping challenges

08/28/2013 

Entegris, Inc. and imec announced they are collaborating to advance the development and broaden the adoption of 3D integrated circuits.

Samsung introduces world’s first 3D V-NAND-based SSD

08/14/2013 

Samsung today introduced the first solid state drive (SSD) based on its recently released 3D V-NAND technology. Samsung announced its new SSD, designed for use in enterprise servers and data centers, during a keynote at the Flash Memory Summit 2013.

Monolithic 3D is now in production: Samsung starts mass producing first 3D vertical NAND flash

08/06/2013 

Zvi Or-Bach, President & CEO of MonolithIC 3D Inc. blogs about Samsung's recent announcement on 3D vertical NAND.

Samsung starts mass producing industry’s first 3D vertical NAND flash

08/06/2013 

New technology represents a breakthrough in overcoming NAND scaling limit and ushers in a new 3D memory era.

Monolithic 3D is now on the roadmap for 2019

08/01/2013 

Zvi Or-Bach, President & CEO of MonolithIC 3D Inc. blogs about the appearance of 3D integration on several roadmaps.

Cascade Microtech and imec successfully probe 25µm-diameter micro-bumps

08/01/2013 

Cascade Microtech, Inc. and imec today announced breakthroughs in probing stacked integrated circuits (3D-SICs), fueling an important growth engine for the semiconductor market.

EUV vs TSV: Which one will become production ready first?

07/31/2013 

Israel Beinglass, CTO of MonolithIC 3D Inc., blogs about roadmap misses and the relationship between two seemingly unrelated technologies. 

3D memory for future nanoelectronic systems

07/28/2013  Bit-growth slows while specialized stacking accelerates innovation in future memory solutions for communications, energy, and health-care.

Rudolph announces new metrology suite for advanced packaging

07/24/2013 

Rudolph Technologies, Inc., a provider of process characterization, photolithography equipment and software for the semiconductor, FPD, LED and solar industries, today released three new application-specific configurations of its industry-leading NSX 320 Automated Macro Defect Inspection System.

Brewer Science: Simpler bonding/debonding process needed

07/18/2013 

A variety of techniques and materials have been developed to successfully achieve bonding/debonding for 3D integration, but Tony Flaim, chief technology officer of Brewer Science (Rolla, MO) says they are still too complicated.

Hybrid Memory Cube nears engineering sample milestone

07/17/2013 

Engineering samples of The Hybrid Memory Cube (HMC) are expected this summer, with high volume manufacturing coming next year. It will be one of the first high volume devices employing 3D integration and through silicon vias (TSVs), employing a bottom logic layer and 4-8 stacked DRAM layers.

SEMICON West R&D panel discusses the future of semiconductor technology

07/10/2013 

Leaders of research consortia from around the world sat down to share updates and insights with SEMICON West attendees on Wednesday morning.

Dow Corning joins imec for advancement of enabling technologies for 3D-IC

07/09/2013 

Dow Corning announced Monday that it is among the newest member organizations to join imec, a leading research center for the advancement of nano-electronics.




WEBCASTS



Environment, Safety & Health

Date and time TBD

The semiconductor industry is an acknowledged global leader in promoting environmental sustainability in the design, manufacture, and use of its products, as well as the health and safety of its operations and impacts on workers in semiconductor facilities (fabs). We will examine trends and concerns related to emissions, chemical use, energy consumption and worker safety and health.

Sponsored By:

Wafer Processing

Date and time TBD

As the industry moves to 10nm and 7nm nodes, advances in wafer processing – etch, deposition, planarization, implant, cleaning, annealing, epitaxy among others – will be required. Manufacturers are looking for new solutions for sustained strain engineering, FinFETs, FDSOI and multi-gate technologies, 3D NAND, and high mobility transistors.

Sponsored By:

More Webcasts