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04/01/2005  When measuring semiconductor features, recent industry developments illustrate that the linkage between metrology and contamination control is getting tighter as features shrink.

04/01/2005  EAST HILLS, N.Y.-On the heels of a recent market study indicating that Asia is driving-and will continue to drive over the next several years-the cleanrooms hardware and garment market, filtration/purification developer Pall Corp. (www.pall.com) has opened a new manufacturing facility in Beijing, China, and has named Jon Weiner the first president of Pall Microelectronics Asia.

04/01/2005  Most IC packaging technologists are aware of this “other” issue, but this topic has never required serious consideration.

04/01/2005  Contamination monitoring is the last element of the cleanroom's production process to become automated, but as manufacturers are pushed to the limits of their manual contamination-monitoring capabilities, demand for new technologies is growing.

04/01/2005  It is indisputable that cleanroom garments are still one of the most important components of contamination control in the cleanroom.

04/01/2005  People concerned with contamination control certainly know a lot about such things as cleanrooms, barrier isolators, minienvironments, fume hoods and glove boxes.

04/01/2005  A BSL-3 lab and Animal BSL-3 lab can be simple or sophisticated, depending upon their purpose.

04/01/2005  The cleanroom industry has always been dynamic. The rate of change may now be accelerating thanks to activity in China.

04/01/2005  Time is a finite and precious commodity. Talent is a gift.

04/01/2005  Every now and then, it’s especially good to step out of your normal activities and see what’s going on at other companies and universities.

04/01/2005  The major assembly and test subcontractors ended 2004 with revenues up significantly over 2003, but with a slowing trend leading into 2005.

04/01/2005  Electronics have dramatically changed the way we live, conduct business, communicate, and educate.

04/01/2005  The technical challenges and the manufacturing complexity confronting conventional methods of increasing IC device density in 2-D are increasing at a high rate.

04/01/2005  Enabling Global Optimization & Characterization of Design

04/01/2005  Packaging Technology Ready For Change

04/01/2005  Die Attach

03/31/2005  (March 31, 2005) Washington — NIST and Utah State University (USU) have joined together in a collaborative partnership to develop and calibrate optical sensors for defense, homeland security, weather prediction, and climate research.

03/31/2005  RALEIGH, NC -- (MARKET WIRE) -- 03/31/2005 -- HydroFlo, Inc. today announced that its portfolio company, Metals & Arsenic Removal Technology, Inc. (MARTI) has received the first order of arsenic removal media (ARTI-64) from Kelly International.

03/31/2005  CHICAGO--(BUSINESS WIRE)--March 30, 2005--SSA Global, a leading global provider of extended enterprise solutions and services, announced SSA PLM 8.0, a new product lifecycle management solution designed to help customers achieve lower total cost of ownership through integration with other enterprise systems. The solution also provides the capability to more easily meet regulatory compliance and accelerate the time to market for new products.

03/31/2005  (March 31, 2005) Palo Alto, Calif. — Semiconductors in medical imaging modalities are increasing, and should continue to do so until 2008; therefore, semiconductor vendors anticipate growth opportunities, especially in imaging systems such as ultrasounds and computed tomography (CT) scanners.