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FEI's DualBeam with STEM targets nanoelectronics

06/12/2007  FEI Company's next-generation DualBeam product, the Expida 1255S, integrates wafer-level STEM (scanning/transmission electron microscopy) sample preparation with ultra-high-resolution imaging and analysis.

NVE wins patent for thermomagnetically assisted spin-momentum transfer MRAM

06/12/2007  The U.S. Patent and Trademark Office (USPTO) has notified NVE Corporation, Eden Prairie, Minn., of the expected grant of a patent titled "Thermomagnetically Assisted Spin-Momentum-Transfer Switching Memory," relating to magneto-thermal and spin-momentum transfer MRAM inventions.

NEWS FROM JAPAN: PC makers find flash; chemical firms spend for growth

06/12/2007  A roundup of news from the past week in Japan finds PC makers turning to flash, chemical makers opening their wallets, new silicon transport components, and a behemoth of a CMOS image sensor prototype.

US, Korea scientists make hybrid nanowire memory devices

06/11/2007  June 11, 2007 - Researchers from the National Institute of Standards and Technology (NIST), George Mason U., and Korea's Kwangwoon U. have fabricated a hybrid memory device incorporating both silicon nanowires and nonvolatile semiconductor-oxide-nitride-oxide-semiconductor (SONOS) technology, which they suggest is more reliable than other nanowire-based memory devices.

STATS ChipPAC offloading more lines to China

06/11/2007  June 11, 2007 - STATS ChipPAC Ltd. says it will sell certain assembly and test assets for its discrete power packages to China's Ningbo Mingxin Microelectronics Co. Ltd., following a similar transaction a year ago to farm out some work to mainland China in order to pursue better growth opportunities in areas such as system-in-package, flip-chip, and 3D technologies.

Mentor buys place-and-route firm Sierra Design

06/11/2007  June 11, 2007 - Mentor Graphics has acquired Sierra Design Automation for $90 million in a half-and-half cash/stock deal, bolstering its design offerings. Mentor says the deal will be "slightly accretive" for FY07 (ending Jan.31 2008), and shave about $0.02 off of its anticipated FY08 earnings.

Synova, Disco Co-develop Hybrid Dicing Tool

06/11/2007  Synova and Disco Hi-Tec Europe will partner to develop a hybrid dicing tool that uses both Synova's Laser Microjet (LMJ) water-jet-guided laser technology and the latest-generation blade-saw dicing systems for advanced dicing applications. The resulting tool is expected to allow semiconductor manufacturers to achieve a high throughput while minimizing damage to silicon and advanced-material wafers of any thickness.

Tessera Introduces Wafer-level Camera Technology

06/11/2007  Moore's Law is about to be tested — again. Tessera Technologies added to its wafer-level technology portfolio with the unveiling of the OptiML WLC, a wafer-level camera technology that will reportedly advance the integration of miniaturized cameras in cell phones, personal computers, security cameras, and other electronics.

Nanocoating opportunities grow as layers get thinner

06/11/2007  Nanocoating and ultra thin film deposition technology is expanding from industrial applications to semiconductors, photovoltaic cells, magnetic memory, and space exploration. Small Times' Hugh Willett reports.

ViRexx collaborates with Canada's NINT and DRDC Suffield

06/11/2007  ViRexx Medical Corp., a company focused on immunotherapy treatments for certain cancers, chronic hepatitis B & C and embolotherapy treatments for tumors, has signed collaboration agreements with the National Research Council (NRC) Canada's National Institute for Nanotechnology (NINT) and Defence Research and Development Canada Suffield (DRDC Suffield) with networking and financial contribution from NRC-Industrial Research Assistance Program (IRAP).

Stanford, U-Cal algorithm helps design more reliable CNT circuits

06/08/2007  Engineers from Stanford and the U. of Southern California have devised a method to design circuits containing carbon nanotubes (CNTs) that should work even when many of the nanotubes are twisted and misaligned.

Analyst: Intel pushing out more chip orders

06/08/2007  June 8, 2007 - Intel Corp. appears to be pushing out all orders and shipments for equipment relating to the upgrade of its fab in New Mexico from 200mm to 300mm-compatible, just three months after announcing it would make that facility into its fourth 45nm production site, according to an analyst report.

Report: TSMC padding 65nm lead over UMC, Chartered

06/08/2007  June 8, 2007 - New orders for more of TSMC's 65nm capacity from Qualcomm Inc. and Broadcom Corp., which are eyeing increased demand from the mobile phone market, puts TSMC even further ahead of rivals seeking to add customers for their leading-edge offerings, according to the Taiwan Economic News.

Nanometrics trims product lines, eyes core metrology market growth

06/08/2007  June 8, 2007 - Yet another move in a busy spring has left Nanometrics Inc. feeling better about its positioning in the market with a core group of metrology technologies, after the recent sale of two tangential product lines, the company says.

Amkor Exec Keynotes IWLPC

06/08/2007  Oleg Khaykin, chief operation officer (COO) and executive VP of Amkor Technology, Inc., will keynote the International Wafer-level Packaging Conference (IWLPC), September 17–19 in San Jose. The event, co-sponsored by the SMTA, also hosts workshops, panels, and technical presentations.

Octillion reports breakthrough in "NanoPower Windows" for electricity generation

06/08/2007  Octillion Corp. says that in early models of its photovoltaic NanoPower Windows product, scientists have successfully engineered and assembled a mechanically stable, visually transparent prototype that achieves optically active down-conversion and displays good electrical properties with no electrical shorts. This marks a significant breakthrough in development of a working prototype capable of generating electricity from sunlight without losing significant transparency.

Aerotech's hi-res stage provides 360-degree continuous travel

06/08/2007  Aerotech's new ABRT rotary air-bearing stage series is designed to meet the exacting requirements of MEMS/nanotechnology device fabrication, wafer inspection, and high-precision metrology.

Okmetic's high-uniformity SOI wafers promise super-sensitive MEMS

06/08/2007  Okmetic Oyj, supplier of silicon wafers for MEMS sensors, says it has transferred highly homogeneous silicon on insulator (SOI) wafers into production. The new material reportedly enables greater sensitivity.

Nanotech bites into dental market, though dentists not always aware

06/08/2007  Millennium Research Group (MRG) says, in its US Markets for Dental Implants 2007 report, that prominent dental implant manufacturers are incorporating nanotechnology into their dental implant surface designs because the technology is purported to cut healing time in half and improve osseointegration.

Alcatel, Tronics join for MEMS DRIE

06/07/2007  June 7, 2007 - Tronics Microsystems SA and Alcatel Micro Machining Systems (AMMS) say they will jointly develop deep reactive ion etch (DRIE) systems for "extreme-performance" MEMS.