ASML unveils 193nm lithography tool

Veldhoven, The Netherlands–Nov. 7, 2000–ASML Lithography has developed a new 193nm Step & Scan lithography tool for high-volume production of semiconductor devices at the 100nm technology node.

The PAS 5500/1100 system combines a 0.75 numerical aperture (NA) lens, improved leveling performance, and overlay with an exposure capacity exceeding 90 200mm wafers per hour.

“Our new PAS 5500/1100 product supports the imaging requirements of the world’s leading-edge IC makers as they migrate to 100nm volume production,” says Martin van den Brink, executive vice president of Marketing and Technology at ASML. “This newest addition to our product portfolio is one of the most advanced 193nm lithography tools available today–providing tighter resolution, better process overlay, and higher throughput than any other system currently available on the global market.”

Initial shipments of the tool will begin in March 2001.

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