Micronic unveils mask metrology system

October 23, 2003 – Micronic Laser Systems AB, Taby, Sweden, has introduced a new registration measurement system for TFT-LCD photomasks. Designed to complement the company’s pattern generators, the MMS15000 verifies photomask pattern placements with an accuracy better than 100nm, and can measure masks as large as 1300 x 1500mm. The system already has a customer in Japan, with shipment scheduled for 2H03.

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