August 27, 2003 – Toshiba Corp. is using Applied Material’s CVD low-k dielectric films in its 90nm CMOS4 process technology, the companies said. The processes are being used in Toshiba’s TC3000 ASICs, produced at its Oita, Japan facility.
August 27, 2003 – Toshiba Corp. is using Applied Material’s CVD low-k dielectric films in its 90nm CMOS4 process technology, the companies said. The processes are being used in Toshiba’s TC3000 ASICs, produced at its Oita, Japan facility.
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