December 17, 2003 – ASML MaskTools, Santa Clara, CA, a subsidiary of Netherlands-based ASML, and Photronics Inc., Brookfield, CT, have agreed to co-develop a production-ready maskmaking infrastructure for ASML MaskTools’ CPL technology, a technique that enables low-k lithography. Under the deal, ASML MaskTools will help develop a CPL manufacturing flow optimized for Photronics’ maskmaking process, while Photronics will receive an R&D license encompassing its maskmaking, wafer imaging, and software implementation.