Synopsys, Photronics join for photomask DFM

September 14, 2004 – Synopsys Inc., Mountain View, CA, and Photronics Inc., Brookfield, CT, are forming a joint program to improve design-for-manufacturing (DFM) and mask synthesis for advanced photomasks.

Specifically, the two will focus on improving design flow for alternating aperture phase-shift masks, improve yield and cycle times using strong resolution-enhancement techniques, and reduce turnaround times for mask inspection using Synopsys’ DFM software tools.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.