Litho project gains $36M funding

May 5, 2004 – A proposed $36 million JV to develop nanoimprint lithography has received approval by the National Institute of Standards and Technology’s (NIST) Advanced Technology Program.

The three-year project, supported by Molecular Imprints Inc., KLA-Tencor, Photronics, Motorola Labs, and the U. of Texas at Austin, aims to establish a technology infrastructure using S-FIL process, including system, materials, and mask development, focusing on dense contact layers used in IC fabrication.

NIST will contribute $17.6 million of the overall funding, with the rest spread out among the other participants.

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