November 5, 2004 – Dainippon Screen Mfg. Co. and Nikon Corp. have said they will expand the scope of their joint study on advanced semiconductor manufacturing systems, according to Jiji Press Ltd.
The two firms will work together to develop systems to make chips with line widths of less than 90nm, extending their alliance formed in July 2003 that targeted a line width of 90nm.
They will build a new system by integrating Nikon’s photolithography machine with Dainippon’s photoresist processing equipment.