OAI adds NIL module for mask aligners

August 1, 2007 – Optical Associates Inc. (OAI) says it has added a nanoimprint lithography module as an option to its mask aligners. The module, either as a new order or retrofit, comes with wafer and mask holder and a nanoimprint controller to control the process steps, plus a “starter kit” of materials, the company said in a statement.

The NIL technology comes from Nanolithosolution Inc., a spinout of Hewlett-Packard that is helping HP get its “crossbar array” interconnects ready for devices maybe by 2010, several nodes sooner than expected.

“OAI chose the HP process due to its one-step Auto Release [imprint mold design] which simplifies the imprint process,” said Charles Turk, president of OAI.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.