October 10, 2006 – Nikon Corp. and Brion Technologies Inc. are partnering to combine Brion’s high-performance computational lithography technology with Nikon’s high-NA immersion equipment, to deliver “lithography-enabled DFM applications.”

“New lithography simulation and OPC models must be developed to improve CD performance for 45nm and below,” the companies said, in a statement. To achieve nanometer-level critical-dimension control with fast turnaround time, models must be characterized using not just traditional input parameters such as lithography dose, defocus, light source type, and lens parameters, but also immersion effects, polarization impacts, global and local flare, wavefront aberrations, and other factors.

“Combining the leading-edge immersion and polarization information from Nikon and the market-leading computational lithography products from Brion enables unprecedented OPC accuracy, which is key to superior total lithography performance,” said Tadahiro Takigawa, corporate executive for business and technology development at Brion.

“The accuracy of OPC models can be significantly improved and mask qualification time reduced, by incorporating our unique tool characteristics into the computational lithography solution,” added Toshikazu Umatate, Executive Officer, Precision Equipment Company, Nikon Corp.