July 16, 2012 – PRNewswire — Cymer Inc. (Nasdaq:CYMI), supplier of light sources for lithography processes in semiconductor manufacturing, is seeing adoption of its focus drilling technology for ArF immersion light sources and SmartPulse data management tool for light source performance monitoring, both introduced in 2011.
The products have been adopted by leading chipmakers globally. They are part of Cymer’s OnPulse family of support products.
Focus drilling is a process of broadening the light source bandwidth that leads to a higher depth of focus needed for contacts and vias. The technology leverages unique advancements in the light source line narrowing module (LNM) and bandwidth analysis module (BAM). Designed to support the extension of 193nm immersion lithography, focus drilling improves depth of focus without compromising critical dimension (CD) uniformity, performance or productivity.
The tool has been shipped as a new product and upgrade to the existing install base. It is available for the XLR 600ix, XLR 500i, XLA 400 and XLA 300 light sources.
The SmartPulse data management tool can operate within a fab-wide fault detection and classification (FDC) system, which supports improved process control and excursion prevention, improving cycle time and lowering costs. SmartPulse also features new metrology to fully characterize light source performance in real time, enabling rapid troubleshooting and fast ramping of tools and fabs.
SmartPulse is available on Argon Fluoride (ArF) light sources.
Cymer Inc. (Nasdaq: CYMI) develops light sources used by semiconductor manufacturers to pattern advanced semiconductor chips, and is pioneering a new silicon crystallization tool for the display industry. For more information, please visit Cymer’s website, http://www.cymer.com/.