January 19, 2012 — Hine Automation LLC shipped its Star SL-300 single-substrate vacuum transfer system to Annealsys in Montpellier, France. Annealsys will integrate the wafer transfer system onto its MC-200 metal-organic chemical vapor deposition (MOCVD) tool for R&D and pilot environments.
The Star SL-300 vacuum transfer system is designed for 300mm and smaller wafers, used in semiconductor manufacturing or related industries. Its Slide and Z-lift mechanisms enable single substrate automation in tools that do not have lifts pin in the process chamber. The Star was designed to reduce or eliminate the many issues encountered with magnetically coupled transfer mechanisms, cost-effectively, said Jose Salas, business manager, Hine Automation.
The MC-200 can process many wafers sizes up to 200mm and offers the option of lower deposition temperatures thanks to its PE-MOCVD option.
Annealsys designs and manufactures rapid thermal processing (RTP) and chemical vapor deposition (CVD) equipment for R&D, quality control (QC) and niche production applications. Learn more at www.annealsys.com.
Hine Automation LLC designs and manufactures vacuum automation systems and robotic components for solar, semiconductor, flat panel display and related manufacturing tool OEMs. Learn more at www.hineautomation.com.